ZL036065 Plasma Mini ALD

ZL036065 Plasma Mini ALD
 
System Specification : -
Process Type : Thermal & plasma time divided ALD
Gases Flow Type : lateral type (Traveling wave)
Available Film : Metal oxide thin film based Plasma/Metal oxide thin film based H2O/Metal thin film based H2Plasma
Film Uniformity: AI2O3 士 1% on the 200x200 [mm2] square substrate
Substrate Size & Temperature: 25~ 400 [Xÿ] 士 1 [%] on The Substrate 1 50x1 50 [mm2]
System Dimension (WxLxH)  : 920x650x1 1 00 (Substrate to ground) [mm ]
Base Pressure : <5.0x10-3 [Torr]
Control System : Provided laptop computer & windows 1 0 based, advance and basic GUIs witH Import/ export of Excel compatible recipes and data
Number of MFC : Carrier & purge gas / 3[EA] & 2nd reactant gas / 2EA