Application & Features:
Designed for semiconductor facilities such as CVD, Diffusion, and Etch processes
Available in Heat and Wet type configurations
Capacity options: 600 slm, 1000 slm, and 1500 slm
Compact system size of 800 × 850 × 1700 mm
System weight: 450 kg
Heating temperature up to 750°C
Mainly designed for flammable gas handling
Features high removal efficiency
Equipped with a special heater module
Uses less coolant compared to other systems